Method for controlling the formation of intermetallic compounds in solder joints

ABSTRACT

The present invention relates to a method for controlling the formation of the intermetallic compounds in solder joints, The types of the intermetallic compounds between the SnAgCu solders and the Ni-bearing substrate can be controlled by adjusting the copper concentration in the SnAgCu solders. If the SnAgCu solder has a copper concentration higher than or equivalent to 0.6 wt. %, the soldering intermetallic compound includes a continuous (Cu 1−x Ni x ) 6 Sn 5  layer. If the copper concentration of the SnAgCu solders is lower than or equivalent to 0.4 wt. %, the soldering intermetallic compound includes a continues (Ni 1−y Cu y ) 3 Sn 4  layer and a non-continuous (Cu 1−x Ni x ) 6 Sn 5  layer. If the copper concentration of the SnAgCu solders is between 0.4 wt. % to 0.6 wt. %, the soldering intermetallic compound includes the continuous (Cu 1−x Ni x ) 6 Sn 5

CROSS-REFERENCE TO RELATED APPLICATION

[0001] This application claims the priority benefit of Taiwan application serial no. 90132742, filed Dec. 28, 2001.

BACKGROUND OF THE INVENTION

[0002] 1. Field of Invention

[0003] The present invention relates to a method for controlling the formation of an intermetallic compound in solder joints. More particularly, the present invention relates to a method for controlling the types of the intermetallic compounds formed between the SnAgCu solders and the Ni-bearing substrate by adjusting the copper concentration in the SnAgCu solder.

[0004] 2. Description of Related Art

[0005] Integrated circuitry (IC) packaging is an important part of the semiconductor fabrication backend processes, which protects each chip and electrically connects the pads on the chips to the printed circuit board. The packages of the chip and the printed circuit board are connected through solders, while the soldering pads in contact with the solders commonly use Au/Ni or Pd/Ni bi-layer structure as a surface finish or a metallization. During the reflow soldering process, gold or palladium in the pad first reacts with the solder and was then merged into the solder. After using up gold or palladium, the underlying nickel keeps reacting with the solder to form soldering intermetallic compounds. If the mechanical strength of a solder joint is not strong enough, it may cause reliability problems.

[0006] The Pb—Sn solder is one of the most widely used materials for soldering. However, lead containing in the Pb—Sn solder, especially its oxides, can be toxic and harmful to the environment and human health. Therefore, lead-bearing solders are proposed to be banned in many countries.

[0007] To replace the lead-bearing solders, SnAgCu series of solders are generally considered to be one of the most promising replacements. The SnAgCu solders with different compositions have different physical and electrical properties. The prior art researches relating to SnAgCu solder series include U.S. patent application No. 5,527,628 and Japanese Patent Application No. 2001-504760. The prior art researches mostly focus on the properties of SnAgCu solder series, rather than on the reactions between solders and pads or the soldering technique for connecting both. None of the prior art materials disclose a method for controlling the types of the intermetallic compounds between the SnAgCu solders and the Ni-bearing substrate by adjusting the compositions of the SnAgCu solders.

SUMMARY OF THE INVENTION

[0008] Accordingly, the invention provides a method for controlling the types of the intermetallic compounds between the SnAgCu solders and the Ni-bearing substrate by adjusting the compositions of the SnAgCu solders.

[0009] The present invention relates to a method for controlling the formation of the intermetallic compounds. The types of the intermetallic compounds between the SnAgCu solders and the Ni-bearing substrate can be controlled by adjusting the copper concentration in the SnAgCu solders.

[0010] As embodied and broadly described herein, the invention provides a method for controlling the formation of the intermetallic compounds. A substrate having a Ni-bearing bonding pad, for example, Au/Ni double-layered pad or Pd/Ni double-layered pad, is provided. An amount of SnAgCu solder is formed on the Ni-bearing pad. A reflow soldering process is performed, so that the SnAgCu solder reacts with the Ni-bearing pad to form a solder joint. If the copper concentration in SnAgCu solder is between 0.6 wt. % to 3.0 wt. % (including 0.6 wt. %), the continuous soldering intermetallic interlayer formed at the interface is a (Cu_(1−x)Ni_(x))₆Sn₅ layer. If the copper concentration in SnAgCu solder is between 0 wt. % to 0.4 wt. % (including 0.4 wt. %), the continuous soldering interlayer is a (Ni_(1−y)Cu_(y))₃Sn₄ layer. If the copper concentration in the SnAgCu solder is between 0.4 wt. % to 0.6 wt. %, the soldering interlayer is a composite layer including the continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer and the continuous (Ni_(1−y)Cu_(y))₃Sn₄ layer.

[0011] The present invention relates to a method for controlling the formation of the intermetallic compounds. The types of the intermetallic compounds can be controlled by adjusting the minor copper concentration in the SnAgCu solders.

[0012] The method of the present invention for controlling the formation of the intermetallic compounds can not only control the types of the intermetallic compounds, but also growth rates of the soldering intermetallic compounds.

[0013] The method of the present invention for controlling the formation of the intermetallic compounds is greatly influenced by the copper concentration in the solder. Particularly, if the copper concentration is between 0.4 wt. % to 0.6 wt. %, the types of the intermetallic compounds can vary significantly due to minor processing errors in Cu concentration, further deteriorating reliability of the solder. Therefore, the present invention provides a method for controlling the formation of desirable intermetallic compounds at the interface.

[0014] It is to be understood that both the foregoing general description and the following detailed description are exemplary, and are intended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention. In the drawings,

[0016]FIGS. 1a-1 h are schematic diagrams for the structures and the growth states of the intermetallic compounds by adjusting the copper concentration in the SnAgCu solders according to one preferred embodiment of this invention, while the copper concentration for each diagram is shown on the top line respectively;

[0017]FIGS. 2a-2 d are cross-sectional views for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0.6 wt. % to 1 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while the copper concentration for each diagram is shown on the top line respectively;

[0018]FIGS. 3a-3 d are top views for the corresponding FIGS. 2a-2 d, while the copper concentration for each diagram is shown on the top line respectively;

[0019]FIG. 4 is a comparison figure between x-ray diffraction spectrums for Cu—Ni—Sn intermetallic compound and Cu₆Sn₅ (JCPDS);

[0020]FIGS. 5a and 5 b are respectively a cross-sectional view and a top view for the soldering intermetallic compound after the Ni pad reacting with the solder containing 3 wt. % copper for 10 minutes under 250° C., taken by the electron microscope;

[0021]FIG. 6a is a cross-sectional view for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0.4 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while FIG. 6b is a magnifying view of FIG. 6a;

[0022]FIGS. 7a-7 b are top views for the corresponding FIGS. 6a-6 b respectively;

[0023]FIG. 8 is the x-ray diffraction spectrum of the intermetallic compounds of FIG. 7;

[0024]FIGS. 9a-9 b are cross-sectional views for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0 wt. % to 0.2 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while the copper concentration for each diagram is shown on the top line respectively;

[0025]FIGS. 10a-10 b are top views for the corresponding FIGS. 9a-9 b, while the copper concentration for each diagram is shown oil the top line respectively;

[0026]FIG. 11 is the x-ray diffraction spectrum of Ni₃Sn₄ intermetallic compound;

[0027]FIG. 12a is a cross-sectional view for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0.5 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while FIG. 12b is a magnifying view of FIG. 12a;

[0028]FIG. 13 is the x-ray diffraction spectrum of the intermetallic compounds of FIG. 12; and

[0029]FIG. 14a is a cross-sectional view for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0.5 wt. % copper for 25 hours under 250° C., taken by the electron microscope, while FIG. 14b is a magnifying view of FIG. 14a.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0030] In the present invention, the copper concentrations of the SnAgCu solder series are adjusted to 0˜3.0 wt. %; that is, different amounts of copper are mixed into the solder before soldering to adjust the copper concentrations.

[0031] The mixed copper can distribute evenly in the solder and react with tin to form Cu₆Sn₅ intermetallic compounds. The more the copper is added into the solder, the more the resultant Cu₆Sn₅ particles are. The sizes of the Cu₆Sn₅ particles in the solder depend on the cooling rates in the reflow soldering process. The faster the cooling rate of the solder is, the smaller the size of the Cu₆Sn₅ particle is. It is beneficial for the mechanical strength of the solder to form small and evenly distributed Cu₆Sn₅ particles in the solder. Moreover, it is favorable to contain tiny amounts of copper in the SnAg solder for lowering the liquidizing temperature of the solder. The silver concentration of the solder is between 3.5 wt. % to 4 wt. %. Silver will react with tin in the solder to form Ag₃Sn intermetallic compounds that distribute evenly in the solder.

[0032]FIGS. 1a-1 h are schematic diagrams for the structures and the growth states of the intermetallic compounds by adjusting the copper concentration in the SnAgCu solders according to one preferred embodiment of this invention, while the copper concentration for each diagram is shown on the top line respectively. From FIGS. 1a-1 d, it clearly shows that the resultant soldering intermetallic compound is a continuous layer of the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic compounds in each diagram for the solders containing copper equivalent to or more than 0.6 wt. %. From FIGS. 1e-1 g, it clearly shows that both the (Ni_(1−y)Cu_(y))₃Sn₄ intermetallic compound and the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic form for the solders containing copper between 0.2˜0.5 wt. %. However, as the copper concentration decreases, the (Ni_(1−y)Cu_(y))₃Sn₄ intermetallic compounds underlying the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic layer become more and (Cu_(1−x)Ni_(x))₆Sn₅ becomes less. If the copper concentration decreased to as low as 0.4 wt. % (see FIG. 1f), the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic layer becomes non-continuous and can not cover the interface. If the copper concentration decreased to equivalent to or lower than 0.4 wt. % (see FIGS. 1f and 1 g), the resultant (Ni_(1−y)Cu_(y))₃Sn₄ intermetallic compounds become a continuous layer at the interface, connecting the solder and the bonding pad.

[0033] The copper concentration in FIG. 1h is 0 wt. %, i.e. copper-free. Of course, there is no Cu₆Sn₅ intermetallic compound existing in the copper-free solder. Therefore, there is only one layer of Ni₃Sn₄ ((Ni_(1−y)Cu_(y))₃Sn₄, y=0) intermetallic compound at the interface.

[0034] In conclusion, as the copper concentration decreases, the resultant intermetallic compound at the interface changes from a single (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic layer to (Cu_(1−x)Ni_(x))₆Sn₅ and (Ni_(1−y)Cu_(y))₃Sn₄ coexisting. If the copper concentration further decreases, the interlayer at the interface turns into a (Ni_(1−y)Cu_(y))₃Sn₄ intermetallic layer. That is, as the copper concentrations in the solder change, the structures and the growth states of the resultant intermetallic compounds vary accordingly. The present invention is characterized in that the structures and growth states of the intermetallic compounds at the interface between the pad and the solder can be controlled by adjusting the copper concentration in the SnAgCu solder series.

[0035] Moreover, the growth rates for (Cu_(1−x)Ni_(x))₆Sn₅ and (Ni_(1−y)Cu_(y))₃Sn₄ are quite different. In the present invention, the growth rate of (Cu_(1−x)Ni_(x))₆Sn₅ at the interface is much faster than that of (Ni_(1−y)Cu_(y))₃Sn₄ during the soldering. Even only the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic layer is formed at the interface (the copper concentration is higher than 0.6 wt. %), the growth rate of (Cu_(1−x)Ni_(x))₆Sn₅ at the interface increases along with the increasing copper concentration.

[0036] The present invention only adjust the copper concentration in the solder to a small extent (0˜3 wt. %). Since the copper content in the solder is relatively low (less than 3 wt. %), the present invention will not significantly change the original properties of the solder, thus compatible with the present soldering processes. Furthermore, adding tiny amounts of copper into the solders can effectively prevent formation of fragile Au—Ni—Sn intermetallic compounds. In addition to adding Cu into the solder, the copper atoms also can come from dissolution of Cu pad that is in contact with the solder.

[0037] The present invention is not limited to any specific structures or states of intermetallic compounds; instead, the structures and states of the desired intermetallic compounds at the interface can be adjusted depending on the industrial requirements.

[0038] The method of the present invention for controlling the formation of the intermetallic compounds can not only control the structures and growth states of the intermetallic compounds, but also growth rates of the soldering intermetallic compounds.

[0039] The present invention relates to a method for controlling the structures and growth states of the intermetallic compounds by adjusting the minor copper concentration in the solders. One preferred embodiment of the present invention is described as follows.

[0040] Embodiment

[0041] The SnAgCu solder series used in the present invention is listed in Table 1. TABLE 1 No. Solder Sn (wt. %) Ag (wt. %) Cu (wt. %)  1 Sn3.5Ag 96.5 3.5 0  2 Sn3.9Ag0.2Cu 95.9 3.9 0.2  3 Sn3.9Ag0.4Cu 95.7 3.9 0.4  4 Sn3.9Ag0.5Cu 95.6 3.9 0.5  5 Sn4.0Ag0.5Cu 95.5 4.0 0.5  6 Sn3.9Ag0.6Cu 95.5 3.9 0.6  7 Sn3.9Ag0.7Cu 95.4 3.9 0.7  8 Sn3.9Ag0.8Cu 95.3 3.9 0.8  9 Sn3.5Ag1.0Cu 95.5 3.5 1.0 10 Sn3.9Ag1.0Cu 95.1 3.9 1.0 11 Sn3.9Ag3.0Cu 93.1 3.9 3.0

[0042] For the solder series listed in Table 1, the required preparations are described in the following: mixing tin, silver and copper according to the ratios listed in Table 1 to obtain an alloy. The alloy is then placed in a quartz tube for enfolding in vacuum and is then liquated under 700-850° C. in the furnace. Afterwards, the evenly mixed SnAgCu solder alloy is quenched. The SnAgCu solders with different compositions are placed in the furnace under 250° C., for the later reactions.

[0043] The Ni-bearing bonding pad for reacting with the solder is a nickel plate. The nickel plate is surface-polished and washed by a solution containing 50% volume HCl. Next, the nickel plate is bonded with a flux.

[0044] The processed nickel plate is welded to the melted SnAgCu solder under 250° C. for a reaction time of 2-10 minutes. After the soldering is completed, the intermetallic compounds formed at the soldering interface are then examined by an electronic probe microanalyzer (EPMA) for analyzing the compositions and by x-ray diffraction (XRD) for determining the crystal structures.

[0045] The method of the present invention can be divided into three types by controlling the formation of the following three states for the soldering interface: forming “(Cu_(1−x)Ni_(x))₆Sn₅ interlayer”, “(Cu_(1−x)Ni_(x))₆Sn₅ and (Ni_(1−y))₃Sn₄ coexisting interlayer” and “(Ni_(1−y)Cu_(y))₃Sn₄ interlayer”.

[0046] For forming “(Cu_(1−x)Ni_(x))₆Sn₅ interlayer” (0.6-3 wt. % Cu)

[0047]FIGS. 2a-2 d are cross-sectional views for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0.6 wt. % to 1 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while the copper concentration for each diagram is shown on the top line respectively. FIGS. 3a-3 d are top views for the corresponding FIGS. 2a-2 d, while the copper concentration for each diagram is shown on the top line respectively.

[0048] From FIGS. 2a-2 d and 3 a-3 d, the resultant intermetallic compounds at the interface between the Ni pad and the solder series, including 0.6 wt. % Cu solder (Sn3.9Ag0.6Cu), 0.7 wt. % Cu solder (Sn3.9Ag0.7Cu), 0.8 wt. % Cu solder (Sn3.9Ag0.8Cu) and 1.0 wt. % Cu solder (Sn3.5Ag1.0Cu), have different states. As the copper concentration increases in the solder, the shapes of the resultant intermetallic compounds change from short hexagonal spindle-shaped structures to long hexagonal spindle-shaped structures. For the copper concentrations between 0.6 to 1 wt. %, only one single intermetallic interlayer is formed at the interface. This intermetallic interlayer is analyzed by EPMA to be a compound consisting of copper, tin and nickel (Cu—Ni—Sn intermetallic compound), and the average compositions (atomic ratios) are listed in Table 2. No. Solder Cu (at. %) Ni (at. %) Sn (at. %) 6 Sn3.9Ag0.6Cu 32.2 21.2 46.6 7 Sn3.9Ag0.7Cu 33.6 19.7 46.7 8 Sn3.9Ag0.8Cu 36.8 18.6 44.6 9 Sn3.5Ag1.0Cu 44.1 10.7 45.2

[0049] As the copper concentration of the SnAgCu solder increases, the copper atomic ratio in the Cu—Ni—Sn intermetallic compound increases (from 32.2 at. % to 44.1 at. %) and the nickel atomic ratio decreases (from 21.2 at. % to 10.7 at. %). The tin atomic ratio in the Cu—Ni—Sn intermetallic compound remains a narrow range between 44.6-46.7 at. %, rather than varying along with changes of the copper concentration in the solder. The ratio between the combined atomic ratios of copper and nickel (˜55 at. %) and the tin atomic ratio (˜45 at. %) is within the composition range of (Cu_(1−x)Ni_(x))₆Sn₅ compounds. Therefore, the Cu—Ni—Sn intermetallic compounds should be (Cu_(1−x)Ni_(x))₆Sn₅ compounds. In order to see whether the Cu—Ni—Sn intermetallic compounds are (Cu_(1−x)Ni_(x))₆Sn₅ compounds, x-ray diffraction is used to analyze these compounds as shown in FIGS. 3a-3 d.

[0050]FIG. 4 is a comparison figure between x-ray diffraction spectrums for Cu—Ni—Sn intermetallic compound and Cu₆Sn₅ (JCPDS).

[0051] Referring to FIG. 4, the x-ray spectrums of the Cu—Ni—Sn intermetallic compound and Cu₆Sn₅ (JCPDS) are similar. However, compared with Cu₆Sn₅ (JCPDS), the peaks in the x-ray spectrum of the Cu—Ni—Sn intermetallic compound shift toward larger angles. It is because smaller nickel atoms dissolve into Cu₆Sn₅ and occupy the sub-lattice locations of bigger copper atoms, thus forming the (Cu_(1−x)Ni_(x))₆Sn₅ compounds. Considering the composition analysis of the Cu—Ni—Sn intermetallic compounds by EPMA, it is concluded that Cu—Ni—Sn intermetallic compounds are indeed (Cu_(1−x)Ni_(x))₆Sn₅ compounds. Therefore, the copper concentration in the SnAgCu solder should be controlled between 0.6 wt. % to 1 wt. %, in order to form the (Cu_(1−x)Ni_(x))₆Sn₅ interlayer at the interface.

[0052] On the other hand, if the copper concentration is higher (for example, higher than 3 wt. %), there are two different compositions of the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic compounds formed at the interface.

[0053]FIGS. 5a and 5 b are respectively a cross-sectional view and a top view for the soldering intermetallic compound after the Ni pad reacting with the solder containing 3 wt. % copper for 10 minutes under 250° C., taken by the electron microscope.

[0054] Referring to FIG. 5a, there are two different compositions of intermetallic compounds formed at the interface while the copper concentration is 3 wt. %. For these two different compositions of the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic compounds, one compound forms a continuous layer on the Ni pad, while the other compound is formed on the continuous layer in a non-continuous form. Theses two compositions are (Cu_(0.83)Ni_(0.17))₆Sn₅ (continuous) and (Cu_(0.91)Ni_(0.09))₆Sn₅ (non-continuous) respectively. (Cu_(0.91)Ni_(0.09))₆Sn₅ is not only different form (Cu_(0.83)Ni_(0.17))₆Sn₅ in composition, but also different from the (Cu_(1−x)Ni_(x))₆Sn₅ (x≈0) compounds coming from the solder. From FIG. 5b, as the copper concentration of the solder increases, the shapes of the soldering intermetallic compounds at the interface change from hexagonal spindle-shaped structures into hexagonal columns.

[0055] Moreover, from FIGS. 2 and 5, the growth rates of the (Cu_(1−x)Ni_(x))₆Sn₅ compounds vary significantly as the copper concentration in the solder increases. The higher the copper concentration is, the fast the growth rate of the (Cu_(1−x)Ni_(x))₆Sn₅ compound is. Therefore, the present invention can control the growth rates of the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic compounds at the interface between the pad and the solder by adjusting the copper concentration of the solder. Therefore, the copper concentration in the SnAgCu solders should be controlled between 0.6 wt. % to 3 wt. %, in order to form the (Cu_(1−x)Ni_(x))₆Sn₅ interlayer at the interface. If a thin (Cu_(1−x)Ni_(x))₆Sn₅ interlayer is preferred, it is better to apply the solders with lower copper concentrations.

[0056] For Forming “(Ni_(1−y)Cu_(y))₃Sn₄ Interlayer”

[0057] As the copper concentration is as low as 0-0.4 wt. %, the soldering interlayer formed at the interface is completely different from the aforementioned (Cu_(1−x)Ni_(x))₆Sn₅ layer.

[0058]FIG. 6a is a cross-sectional view for the soldering intermetallic compound after the Ni pad reacting with the solder containing 0.4 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while FIG. 6b is a magnifying view of FIG. 6a. FIGS. 7a-7 b are top views for the corresponding FIGS. 6a-6 b respectively.

[0059] There are two kinds of intermetallic compounds formed at the interface while the copper concentration is 0.4 wt. %. Referring to FIGS. 6a-6 b, one compound of these two intermetallic compounds forms a continuous layer on the pad and is lump-like, while the other compound covers the continuous layer in a non-continuous form and is hexagonal. From FIGS. 7a-7 b, the compounds having hexagonal cross-sections are hexagonal spires, distributed evenly on the continuous layer of the lump-like compounds. From the analysis of EPMA, these hexagonal spires are in fact (Cu_(1−x)Ni_(x))₆Sn₅ compounds, while the underlying lump-like compounds have an average composition of copper 7.3 at. %, nickel 36.5 at. % and tin 56.2 at. %, which is very different from the composition of the aforementioned (Cu_(0.58)Ni_(0.42))₆Sn₅ (Cu 32.2 at. %, Ni 23.7 at. %, Sn 44.1 at. %).

[0060] In order to see whether the lump-like intermetallic compounds are (Ni_(1−y)Cu_(y))₃Sn₄ compounds, x-ray diffraction is used to analyze these compounds. FIG. 8 is the x-ray diffraction spectrum of the intermetallic compound of FIG. 7.

[0061] Referring to FIG. 8, there are both (Cu_(1−x)Ni_(x))₆Sn₅ and (Ni_(1−y)Cu_(y))₃Sn₄ coexisting at the interface, as the copper concentration is lowered to 0.4 wt. %. From the analysis of EPMA and x-ray, it is concluded that the lump-like compound is (Ni_(1−y)Cu_(y))₃Sn₄ (y=0.17) and the hexagonal spire compound is (Cu_(1−x)Ni_(x))₆Sn₅ (x=0.42). From FIGS. 6-8, it clearly shows that the composition of the continuous interlayer at the interface is changed from (Cu_(1−x)Ni_(x))₆Sn₅ into (Ni_(1−y)Cu_(y))₃Sn₄, as the copper concentration of the solder shifts from 0.6 wt. % to 0.4 wt. %. Therefore, the composition shift of the continuous interlayer at the soldering interface occurs within the copper concentration range of 0.4-0.6 wt. %.

[0062]FIGS. 9a-9 b are cross-sectional views for the soldering intermetallic compounds after the Ni pad reacting with the solder containing 0 wt. % to 0.2 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while the copper concentration for each diagram is shown on the top line respectively. FIGS. 10a-10 b are top views for the corresponding FIGS. 9a-9 b, while the copper concentration for each diagram is shown on the top line respectively.

[0063] Referring to FIGS. 9a-10 b, the mass (size) of the (Cu_(1−x)Ni_(x))₆Sn₅ layer at the interface keeps decreasing as the copper concentration becomes lower. From FIG. 9a, the copper concentration in the solder is 0.2 wt. % (Sn3.9Ag0.2Cu), the (Cu_(1−x)Ni_(x))₆Sn₅ compound above (Ni_(1−y)Cu_(y))₃Sn₄ decreases to less than 5% of the interface area, while there is only one (Ni_(1−y)Cu_(y))₃Sn₄ continuous interlayer present at the interface, as shown in FIG. 9b, with a copper concentration of 0 wt. % (Sn3.5Ag).

[0064]FIG. 11 is the x-ray diffraction spectrum of Ni₃Sn₄ intermetallic compounds. From the analysis of x-ray, it is confirmed that the intermetallic compound formed at the interface is a (Ni_(1−y)Cu_(y))₃Sn₄ intermetallic layer while the copper concentration of the solder is 0 wt. % (Sn3.5Ag).

[0065] In conclusion, if the copper concentration of the solder is equivalent to or lower than 0.4 wt. %, the continuous interlayer at the interface is a (Ni_(1−y)Cu_(y))₃Sn₄ (y=0˜0.17) intermetallic layer, no matter how low the copper concentration is. Therefore, as long as the copper concentration of the solder is defined between 0% to 0.4 wt. %, the composition of the continuous interlayer at the interface can be controlled to be (Ni_(1−y)Cu_(y))₃Sn₄.

[0066] For Forming “(Cu_(1−x)Ni_(x))₆Sn₅ and (Ni_(1−y)Cu_(y))₃Sn₄ Coexisting Interlayer”

[0067] As the copper concentration is between 0.4 wt. % to 0.6 wt. % (for example, 0.5 wt. %), there are two continuous intermetallic compounds present at the interface.

[0068]FIG. 12a is a cross-sectional view for the soldering intermetallic compound after the Ni pad reacting with the solder containing 0.5 wt. % copper for 10 minutes under 250° C., taken by the electron microscope, while FIG. 12b is a magnifying view of FIG. 12a.

[0069] From FIGS. 12a-12 b, there are two intermetallic layers existing at the interface. Through the analysis of EPMA, the intermetallic layer near the solder is a (Cu_(1−x)Ni_(x))₆Sn₅ layer, while the other layer near the Ni pad is very thin and its composition is determined as a compound containing copper, nickel and tin. The composition of the compound containing copper, nickel and tin is very different to (Cu_(0.58)Ni_(0.42))₆Sn₅.

[0070]FIG. 13 is the x-ray diffraction spectrum of the intermetallic compound of FIG. 12. From the x-ray result, the soldering interlayer at the interface has both (Cu_(1−x)Ni_(x))₆Sn₅ and (Ni_(1−y)Cu_(y))₃Sn₄. Therefore, it is concluded that the compound containing copper, nickel and tin as a thin layer is (Ni_(1−y)Cu_(y))₃Sn₄.

[0071] In order to precisely measured the composition of the thin layer near the Ni pad, the soldering time is extended to form thicker intermetallic layers, and then measured by EPMA.

[0072]FIG. 14a is a cross-sectional view for the soldering intermetallic compound after the Ni pad reacting with the solder containing 0.5 wt. % copper for 25 hours under 250° C., taken by the electron microscope, while FIG. 14b is a magnifying view of FIG. 14a.

[0073] Referring to FIGS. 14a-14 b, the total thickness of the intermetallic layers at the interface is 56 microns, while the thickness of the layer near the Ni pad is about 5 microns. The composition of the compound containing copper, nickel and tin for the thin layer near the Ni pad is determined as: Cu 7.1 at. %, Ni 38.5 at. %, Sn 54.4 at. % [(Ni_(0.84)Cu_(0.16))₃Sn₄]. This average composition is similar to the compositions of FIGS. 6a-6 b and that [(Ni_(0.83)Cu_(0.17))₃Sn₄] of FIG. 9a. As for the (Cu_(1−x)Ni_(x))₆Sn₅ compound, the average composition is (Cu_(0.56)Ni_(0.44))₆Sn₅, similar to the previous composition (Cu_(0.58)Ni_(0.42))₆Sn₅ under the soldering time of 10 minutes. Therefore, it is concluded that the intermetallic compound between the Ni pad and the (Cu_(1−x)Ni_(x))₆Sn₅ compound is the (Ni_(1−y)Cu_(y))₃Sn₄ compound.

[0074] As shown in FIG. 14, the thickness of the (Cu_(1−x)Ni_(x))₆Sn₅ compound increases as the reaction (soldering) time increases. Therefore, the (Cu_(1−x)Ni_(x))₆Sn₅ compound is formed from soldering reaction at the interface.

[0075] In conclusion, as long as the copper concentration of the solder is limited between 0.4 wt. % to 0.6 wt. %, there is a (Ni_(1−y)Cu_(y))₃Sn₄ layer formed between the Ni pad and the continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer. That is, if the SnAgCu solder containing 0.5 wt. % copper concentration is used, there are two continuous intermetallic layers of the (Cu_(1−x)Ni_(x))₆Sn₅ compound and the (Ni_(1−y)Cu_(y))₃Sn₄ compound formed at the interface. While the copper concentration of the solder is limited between 0.4 wt. % to 0.6 wt. %, the mass of the (Ni_(1−y)Cu_(y))₃Sn₄ intermetallic layer decreases and that of the (Cu_(1−x)Ni_(x))₆Sn₅ intermetallic layer increases.

[0076] The compositions of the intermetallic compounds at the interface after soldering the SnAgCu solder series in Table 1 with the Ni pad are listed in Table 3. Average Relative values of No. Solder Phase States Location Distribution x,y  1 Sn3.5Ag 1 (Ni_(1-y)Cu_(y))₃Sn₄ — Continuous y = 0  2 Sn3.9Ag0.2Cu 2 (Cu_(1-x)Ni_(x))₆Sn₅ Near solder Non-continuous x = 0.40 (Ni_(1-y)Cu_(y))₃Sn₄ Near Ni pad Continuous y = 0.14  3 Sn3.9Ag0.4Cu 2 (Cu_(1-x)Ni_(x))₆Sn₅ Near solder Non-continuous x = 0.42 (Ni_(1-y)Cu_(y))₃Sn₄ Near Ni pad Continuous y = 0.17  4 Sn3.9Ag0.5Cu 2 (Cu_(1-x)Ni_(x)) ₆Sn₅ Near solder Continuous x = 0.42 (Ni_(1-y)Cu_(y))₃Sn₄ Near Ni pad Continuous y = 0.16  5 Sn4.0Ag0.5Cu 2 (Cu_(1-x)Ni_(x))₆Sn₅ Near solder Continuous x = 0.42 (Ni_(1-y)Cu_(y))₃Sn₄ Near Ni pad Continuous y = 0.16  6 Sn3.9Ag0.6Cu 1 (Cu_(1-x)Ni_(x))₆Sn₅ — Continuous x = 0.40  7 Sn3.9Ag0.7Cu 1 (Cu_(1-x)Ni_(x))₆Sn₅ — Continuous x = 0.37  8 Sn3.9Ag0.8Cu 1 (Cu_(1-x)Ni_(x))₆Sn₅ — Continuous x = 0.34  9 Sn3.5Ag1.0Cu 1 (Cu_(1-x)Ni_(x))₆Sn₅ — Continuous x = 0.20 10 Sn3.9Ag1.0Cu 1 (Cu_(1-x)Ni_(x))₆Sn₅ — Continuous x = 0.20 11 Sn3.9Ag3.0Cu 1 (Cu_(1-x1)Ni_(x1))₆Sn₅ Near solder Non-continuous x1 = 0.09 (Cu_(1-x2)Ni_(x2))₆Sn₅ Near Ni pad Continuous x2 = 0.17

[0077] If the copper concentration in SnAgCu solders is between 0.6 wt. % to 3.0 wt. % (including 0.6 wt. %), the type of the soldering interlayer formed at the interface is (Cu_(1−x)Ni_(x))₆Sn₅. If the copper concentration in SnAgCu solders is between 0 wt. % to 0.4 wt. % (including 0.4 wt. %), the type of the soldering interlayer is (Ni_(1−y)Cu_(y))₃Sn₄. If the copper concentration in SnAgCu solder is between 0.4 wt. % to 0.6 wt. %, the soldering interlayer is a composite layer including the (Cu_(1−x)Ni_(x))₆Sn₅ layer and the (Ni_(1−y)Cu_(y))₃Sn₄ layer.

[0078] If there are some (Ni_(1−y)Cu_(y))₃Sn₄, compounds present at the interface, the neighboring (Cu_(1−x)Ni_(x))₆Sn₅ compounds have x values approaching 0.42. The (Ni_(1−y)Cu_(y))₃Sn₄ compounds neighboring the (Cu_(0.58)Ni_(0.42))₆Sn₅ compound have y values approaching 0.17. Since no intermetallic compounds exist between (Cu_(0.58)Ni_(0.42))₆Sn₅ and (Ni_(0.83)Cu_(0.17))₃Sn₄, it implies that there is a tie-line between (Cu_(0.58)Ni_(0.42))₆Sn₅ and (Ni_(0.83)Cu_(0.17))₃Sn₄.

[0079] In conclusion, the present invention has the following advantages:

[0080] 1. The method of the present invention can control the types of the intermetallic compounds by adjusting the minor copper concentration in the SnAgCu solders.

[0081] 2. The method of the present invention for controlling the formation of the intermetallic compounds can not only control the types of the intermetallic compounds, but also growth rates of the soldering intermetallic compounds.

[0082] 3. The method of the present invention for controlling the formation of the intermetallic compounds is greatly influenced by the copper concentration in the solder paste. Particularly, if the copper concentration is between 0.4 wt. % to 0.6 wt. %, the states of the intermetallic compounds vary significantly due to minor processing errors in Cu concentration. Therefore, the present invention provides a method for controlling the formation of desirable intermetallic compounds at the interface.

[0083] It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present invention without departing from the scope or spirit of the invention. In view of the foregoing, it is intended that the present invention cover modifications and variations of this invention provided they fall within the scope of the following claims and their equivalents. 

What is claimed is:
 1. A method for controlling the formation of intermetallic compounds in solder joints, comprising: providing a substrate having a nickel-bearing pad; forming a SnAgCu solder on the nickel-bearing pad; and performing a reflow process to the SnAgCu solder and the nickel-bearing pad, so that the SnAgCu solder reacts with the nickel-bearing pad to form a soldering intermetallic compound, wherein if the SnAgCu solder has a copper concentration between 0.6 wt. % to 3.0 wt. % (including 0.6 wt. %), the soldering intermetallic compound includes a continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer, wherein if the copper concentration of the SnAgCu solder is between 0 wt. % to 0.4 wt. % (including 0.4 wt. %), the soldering intermetallic compound includes a continues (Ni_(1−y)Cu_(y))₃Sn₄ layer and a non-continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer, and wherein if the copper concentration of the SnAgCu solder is between 0.4 wt. % to 0.6 wt. %, the soldering intermetallic compound includes the continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer and the continuous (Ni_(1−y)Cu_(y))₃Sn₄ layer.
 2. The method of claim 1, wherein the SnAgCu solder has a composition of 93.1-96.5 wt. % tin, 3.5-4 wt. % silver and 0-3 wt. % copper.
 3. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0 wt. %, the soldering intermetallic compound includes a continuous Ni₃Sn₄ layer.
 4. The method of claim 3, wherein if the copper concentration of the SnAgCu solder is 0 wt. %, the SnAgCu solder has a composition of 96.5 wt. % tin and 3.5 wt. % silver.
 5. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0.2 wt. %, the soldering intermetallic compound includes a continues (Ni_(0.86)Cu_(0.14))₃Sn₄ layer and (Ni_(0.60)Cu_(0.40))₆Sn₅ formed in a non-continuous form on the (Ni_(0.86)Cu_(0.14))₃Sn₄ layer.
 6. The method of claim 5, wherein if the copper concentration of the SnAgCu solder is 0.2 wt. %, the SnAgCu solder has a composition of 95.9 wt. % tin and 3.9 wt. % silver.
 7. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0.4 wt. %, the soldering intermetallic compound includes a continuos (Ni_(0.83)Cu_(0.17))₃Sn₄ layer and (Cu_(0.58)Ni_(0.42))₆Sn₅ formed in a non-continuous form (Ni_(0.83)Cu_(0.17))₃Sn₄ layer.
 8. The method of claim 7, wherein if the copper concentration of the SnAgCu solder is 0.4 wt. %, the SnAgCu solder has a composition of 95.7 wt. % tin and 3.9 wt. % silver.
 9. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0.5 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.58)Ni_(0.42))₆Sn₅ layer and a continuous (Ni_(0.84)Cu_(0.16))₃Sn₄ layer.
 10. The method of claim 9, wherein if the copper concentration of the SnAgCu solder is 0.5 wt. %, the SnAgCu solder has a composition of 95.6 wt. % tin and 3.9 wt. % silver.
 11. The method of claim 9, wherein if the copper concentration of the SnAgCu solder is 0.5 wt. %, the SnAgCu solder has a composition of 95.5 wt. % tin and 4 wt. % silver.
 12. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0.6 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.60)Ni_(0.40))₆Sn₅ layer.
 13. The method of claim 12, wherein if the copper concentration of the SnAgCu solder is 0.6 wt. %, the SnAgCu solder has a composition of 95.5 wt. % tin and 3.9 wt. % silver.
 14. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0.7 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.63)Ni_(0.37))₆Sn₅ layer.
 15. The method of claim 14, wherein if the copper concentration of the SnAgCu solder is 0.7 wt. %, the SnAgCu solder has a composition of 95.4 wt. % tin and 3.9 wt. % silver.
 16. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 0.8 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.66)Ni_(0.34))₆Sn₅ layer.
 17. The method of claim 16, wherein if the copper concentration of the SnAgCu solder is 0.8 wt. %, the SnAgCu solder has a composition of 95.3 wt. % tin and 3.9 wt. % silver.
 18. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 1.0 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.80)Ni_(0.20))₆Sn₅ layer.
 19. The method of claim 18, wherein if the copper concentration of the SnAgCu solder is 1.0 wt. %, the SnAgCu solder has a composition of 95.5 wt. % tin and 3.5 wt. % silver.
 20. The method of claim 18, wherein if the copper concentration of the SnAgCu solder is 1.0 wt. %, the SnAgCu solder has a composition of 95.1 wt. % tin and 3.9 wt. % silver.
 21. The method of claim 1, wherein if the copper concentration of the SnAgCu solder is 3 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.83)Ni_(0.17))₆Sn₅ layer and (Ni_(0.91)Cu_(0.09))₆Sn₅ formed in a non-continuous form on the continuous (Cu_(0.83)Ni_(0.17))₆Sn₅ layer.
 22. The method of claim 21, wherein if the copper concentration of the SnAgCu solder is 3 wt. %, the SnAgCu solder has a composition of 93.1 wt. % tin and 3.9 wt. % silver.
 23. The method of claim 1, wherein the nickel-bearing pad is a Ni pad, a Au/Ni double-layered pad or a Pd/Ni double-layered pad.
 24. A method for controlling types of soldering intermetallic compounds by adjusting a copper concentration of a SnAgCu solder, wherein a nickel-bearing pad is soldered with the SnAgCu solder to form the soldering intermetallic compound, wherein if the SnAgCu solder has a copper concentration higher or equivalent to 0.6 wt. %, the soldering intermetallic compound includes a continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer, wherein if the copper concentration of the SnAgCu solder is lower than or equivalent to 0.4 wt. %, the soldering intermetallic compound includes a continuous (Ni_(1−y)Cu_(y))₃Sn₄ layer and a non-continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer, and wherein if the copper concentration of the SnAgCu solder is between 0.4 wt. % to 0.6 wt. %, the soldering intermetallic compound includes the continuous (Cu_(1−x)Ni_(x))₆Sn₅ layer and the continuous (Ni_(1−y)Cu_(y))₃Sn₄ layer.
 25. The method of claim 24, wherein the SnAgCu solder has a composition of 93.1-96.5 wt. % tin, 3.5-4 wt. % silver and 0-3 wt. % copper.
 26. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0 wt. %, the soldering intermetallic compound includes a continuous Ni₃Sn₄ layer.
 27. The method of claim 26, wherein if the copper concentration of the SnAgCu solder is 0 wt. %, the SnAgCu solder has a composition of 96.5 wt. % tin and 3.5 wt. % silver.
 28. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0.2 wt. %, the soldering intermetallic compound includes a continuos (Ni_(0.86)Cu_(0.14))₃Sn₄ layer and (Ni_(0.60)Cu_(0.40))₆Sn₅ formed in a non-continuous form on the (Ni_(0.86)Cu_(0.14))₃Sn₄ layer.
 29. The method of claim 28, wherein if the copper concentration of the SnAgCu solder is 0.2 wt. %, the SnAgCu solder has a composition of 95.9 wt. % tin and 3.9 wt. % silver.
 30. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0.4 wt. %, the soldering intermetallic compound includes a continuos (Ni_(0.83)Cu_(0.17))₃Sn₄ layer and (Cu_(0.58)Ni_(0.42))₆Sn₅ formed in a non-continuous form on the (Ni_(0.83)Cu_(0.17))₃Sn₄ layer.
 31. The method of claim 30, wherein if the copper concentration of the SnAgCu solder is 0.4 wt. %, the SnAgCu solder has a composition of 95.7 wt. % tin and 3.9 wt. % silver.
 32. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0.5 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.58)Ni_(0.42))₆Sn₅ layer and a continuous (Ni_(0.84)Cu_(0.16))₃Sn₄ layer.
 33. The method of claim 32, wherein if the copper concentration of the SnAgCu solder is 0.5 wt. %, the SnAgCu solder has a composition of 95.6 wt. % tin and 3.9 wt. % silver.
 34. The method of claim 32, wherein if the copper concentration of the SnAgCu solder is 0.5 wt. %, the SnAgCu solder has a composition of 95.5 wt. % tin and 4 wt. % silver.
 35. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0.6 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.60)Ni_(0.40))₆Sn₅ layer.
 36. The method of claim 35, wherein if the copper concentration of the SnAgCu solder is 0.6 wt. %, the SnAgCu solder has a composition of 95.5 wt. % tin and 3.9 wt. % silver.
 37. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0.7 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.63)Ni_(0.37))₆Sn₅ layer.
 38. The method of claim 37, wherein if the copper concentration of the SnAgCu solder is 0.7 wt. %, the SnAgCu solder has a composition of 95.4 wt. % tin and 3.9 wt. % silver.
 39. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 0.8 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.66)Ni_(0.34))₆Sn₅ layer.
 40. The method of claim 39, wherein if the copper concentration of the SnAgCu solder is 0.8 wt. %, the SnAgCu solder has a composition of 95.3 wt. % tin and 3.9 wt. % silver.
 41. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 1.0 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.80)Ni_(0.20))₆Sn₅ layer.
 42. The method of claim 41, wherein if the copper concentration of the SnAgCu solder is 1.0 wt. %, the SnAgCu solder has a composition of 95.5 wt. % tin and 3.5 wt. % silver.
 43. The method of claim 41, wherein if the copper concentration of the SnAgCu solder is 1.0 wt. %, the SnAgCu solder has a composition of 95.1 wt. % tin and 3.9 wt. % silver.
 44. The method of claim 24, wherein if the copper concentration of the SnAgCu solder is 3 wt. %, the soldering intermetallic compound includes a continuous (Cu_(0.83)Ni_(0.17))₆Sn₅ layer and (Ni_(0.91)Cu_(0.09))₆Sn₅ formed in a non-continuous form on the continuous (Cu_(0.83)Ni_(0.17))₆Sn₅ layer.
 45. The method of claim 41, wherein if the copper concentration of the SnAgCu solder is 3 wt. %, the SnAgCu solder has a composition of 93.1 wt. % tin and 3.9 wt. % silver. 